New Single-Component Resists Based on Functional Polynorborneneimides by Chemical Amplification for Deep UV Lithography
Author :
C.-W. Lee, J.-H. Shin, J.-H. Kang, J.-M. Kim*, D.-K Han, K.-D. Ahn
Journal :
Journal of Photopolymer Science and Technology, 11, 405-408
Publication Date :
1998-08-04
Papers :
papers
Update Date :
16-07-20 00:46
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