New Alicyclic Polymers Based on Protected Dinorbornene Monomers for Application As Deep UV Resists
Author :
K.-D. Ahn, J.-H. Kang, C.-W. Lee, J.-M. Kim*, D.-K. Han, J.-H. Lee, I. Cho, S.-Y. Moon, J.-S. Koo, S.-K. Lee
Journal :
Journal of Photopolymer Science and Technology, 11, 499-504
Publication Date :
1998-08-04
Papers :
papers
Update Date :
16-07-20 00:49
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